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Electron Beam Sources

Arc Suppression Sources

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Custom E-Beam Sources

Self Sealing Cover Plate

Single Pocket Sources

UHV Sources

Rod Fed Sources

Arc Suppression Sources

Crucibless Sources

Arc Suppression Sources



Typical Configurations (Others Available)
®U.S. Patents PE35,024 and 6,064,686, plus foreign counter-parts Click here to download a brochure NOTE: Adobe Acrobat required

Arc-Suppression Option

Features

Operates in hostile particulate laden environments
Does not react to ion sources or other discharges
Operated at pressures > 5 X 10^-3
Available in a wide range of crucible sizes to 6 X 100cc

Source with Arc-Suppression Running @ > 5 millitorr in O2

A source with the Arc-Suppression option is ideal for many applications, such as for optical coating and for ion plating without a pressure barrier. The reduction in arcing results in improved film quality, improved yields, and fewer arc-related maintenance issues.

Arc-Suppression is available as an optional feature for most Telemark production sources. It has a footprint similar to standard sources, but with the high voltage feedthroughs incorporated into the source. Two separate cooling water lines are required to cool the source body and the high voltage assembly.