Ion Beam Sources
Telemark ion beam sources have been designed to provide superior Gridless End-Hall ion beam source performance across large and small substrates. Telemark technology offers low pressure operation (10^-5 mbar) for longer mean free path and higher ion energies than traditional End Hall sources.
The source design is extremely low maintenance with no replaceable internal components. The Telemark ion beam source line is capable of either mixed gas or pure oxygen operation, allowing for deposition of metal oxide films of the highest index and lowest stress. Patented Pulsed Mode for ion assisted fluorides provides fully compacted, damage free results not achievable with any other ion source.
Telemark sources achieve stable films with no substrate pre-heating, and are an excellent choice for depositing durable films on low temperature substrates.
Ion SourcesThe standard ion sources feature single or dual filament for extended operation. Offering both small R&D sources and production worthy sources is ideal for medium to large system installations.
UHV Ion SourceThis compact UHV ion source is ideal for research, development and small production applications.
Ion Current MonitorThe Telemark Ion Current Monitor (ICM) provides REAL TIME Monitoring of Ion Flux throughout ion assisted deposition processes.
There are stand-alone units and integrated units available.