Telemark ST and XIAD ion sources have been designed to provide superior Gridless End-Hall ion source performance across large and small substrates. Telemark ion source technology offers low pressure operation (10^-5 mbar) for longer mean free path and higher ion energies than traditional End Hall sources.
The source design is extremely low maintenance with no replaceable internal components. The Telemark ion source line is capable of either mixed gas or pure oxygen operation, allowing for deposition of metal oxide films of the highest index and lowest stress. Patented Pulsed Mode for ion assisted fluorides provides fully compacted, damage free results not achievable with any other ion source.
The Telemark sources achieve stable films with no substrate pre-heating, and are an excellent choice for depositing durable films on low temperature substrates.

XIAD Ion Source

XIAD Ion Source

1kW

This compact ion source is ideal for research, development and small production applications.
ST55 Ion Source

ST55 Ion Source

1.5kW

Our most popular ion source; The ST55 is a workhorse ion source that features dual filament design for extended operation. This production worthy source is ideal for medium to large system installations.
ST3000 Ion Source

ST3000 Ion Source

3kW

The ST3000 is our most powerful ion source and features dual filament for extended operation. This source is perfect for large batch production systems where high ion energy and excellent power distribution is needed.
Ion Current Monitor (ICM)

Ion Current Monitor

The Telemark  Ion Current Monitor (ICM) provides REAL TIME Monitoring of Ion Flux throughout ion assisted deposition processes.

There are stand-alone units and integrated units available.