For the highest purity thin films, ultra-high vacuum or near ultra-high vacuum environments are necessary. Some of the applications are MBE, surface analysis, mono-layer and high other high purity film needs. Telemark has a complete line of ebeam sources (e-gun) for these applications.

E-Beam Sources

Linear UHV

The 575/578 sources are precise, efficient, linear UHV multi-pocket electron beam sources, ideal for research and development, as well as production applications.
Telemark single pocket e-beam sources to 160cc.

E-Beam Sources

Single Pocket UHV

The 218/259 sources are precise, efficient, single pocket electron beam sources, ideal for research and development, as well as production applications.
“ultra” compact 508 Electron Beam Source

E-Beam Sources

3kW UHV

  • Mounted on 4.5” or 6” CFF for direct replacement of K-cells
  • No beam sweep
  • 1.5cc or 4cc pocket
  • 5kV max.
  • Shutter or Dual HV feedthru can be mounted on 6” CFF

E-Beam Sources

Near UHV Multi-Pocket

Near UHV is defined as 10-9 torr vacuum range. These sources use ferro fluidic feedthroughs for turret rotation and high purity materials in construction. The sources are available with complete CFF mounting as needed.