Single Pocket Sources

Telemark offers single pocket e-beam sources from 1.5cc to 160cc. Telemark single pocket source offerings include High Vacuum (10-7 torr) and Ultra High Vacuum (10-11 torr) models. Installation kits and source shutters can be supplied. Please contact Telemark for your ebeam source requirements for model and configuration assistance.

Model 211

High Performance in a Small Package with Crucible Volumes to 15cc.

  • Rated at 6kW* of power when operated at voltages from -6 to -10kV.
  • Compact design for use in small research and development systems or wherever space is an important consideration.
  • Coils sealed in stainless steel cans are standard

Model 272 and Model 259HV

Performance Proven in High-Power Production Applications

  • Available in crucible volumes up to 100cc for long, uninterrupted evaporation.
  • Rated at 14kW* when operated at -10kV.
  • Capable of evaporating high rates of material such as aluminum. This makes the model 272 ideal for processes that require a coating layer of one micron or more.
  • The 272 is also well suited for operation at lower power levels where a large capacity for subliming materials might be required

Model 211Model 259HV/272
E-Beam Deflection270°270°
Power Rating6 kW*14 kW*
High Voltage Range-6 kV to -10 kV-6 kV to -10 kV
Lateral Coil Resistance7.5 ohms3.0 ohms
Long. Coil Resistance9.5 ohms9.6 ohms
Water Requirements2 gpm(min.)@ 60-70°F (15-21°C)3 gpm(min.)@ 60-70°F (15-21°C)

* Nominal value; actual power rating may vary, depending on customer’s process.

** Model 259 HV is only avalable with 160cc pocket size.

Model 211Model 259HV/272

** Model 259 HV is only avalable with 160cc pocket size.

Telemark Feedthroughs

Telemark HV Feedthrough Cover
HV Feedthrough Cover

Telemark Water Flow Switch
Water Flow Switch

Telemark E-Beam Shutter
E-Beam Shutter

Electro-Pneumatic shutter controls are available with 1″, 32mm, or 2-3/4″ CFF feedthrough shutter assemblies.

Arc Suppression Upgrade
Arc Suppression Upgrade

A source with the Arc-Suppression option is ideal for many applications, such as for optical coating and for ion plating without a pressure barrier. The reduction in arcing results in improved film quality, improved yields, and fewer arc-related maintenance issues.