UHV E-Beam Sources
For the highest purity thin films, ultra-high vacuum or near ultra-high vacuum environments are necessary. Some of the applications are MBE, surface analysis, mono-layer and high other high purity film needs. Telemark has a complete line of ebeam sources (e-gun) for these applications.
Telemark offers 26 different models of e-beam sources, each with many crucibles options. This decision tree can help you find the right source for your situation. Telemark E-beam Source Model Decision Tree
Click a UHV E-Beam product below to learn more
Linear UHV E-Beam Sources
The 575/578 sources are precise, efficient, linear UHV multi-pocket electron beam sources, ideal for research and development, as well as production applications.
Compact Linear UHV E-Beam Sources
The model 539 is multi pocket source with 4cc pockets mounted on a 6 inch CF flange. It is ideal for research and development applications.
Single Pocket UHV E-Beam Sources
The 218/259 sources are precise, efficient, single pocket electron beam sources, ideal for research and development, as well as production applications.
Ultra Compact UHV E-Beam Sources
- Mounted on 4.5” or 6” CFF for direct replacement of K-cells
- No beam sweep
- 4cc pocket
- 5kV max.
- Optional Dual HV feedthru mounted on 4.5″ or 6” CFF
Near UHV Multi-Pocket E-Beam Sources
Near UHV is defined as 10-9 torr vacuum range. These sources use ferro fluidic feedthroughs for turret rotation and high purity materials in construction. The sources are available with complete CFF mounting as needed.