Single Pocket Sources
Telemark offers single pocket e-beam sources from 1.5cc to 160cc. Telemark single pocket source offerings include High Vacuum (10-7 torr) and Ultra High Vacuum (10-11 torr) models. Installation kits and source shutters can be supplied. Please contact Telemark for your ebeam source requirements for model and configuration assistance.
Model 211
High Performance in a Small Package with Crucible Volumes to 15cc.
- Rated at 6kW* of power when operated at voltages from -6 to -10kV.
- Compact design for use in small research and development systems or wherever space is an important consideration.
- Coils sealed in stainless steel cans are standard
Model 272 and Model 259HV
Performance Proven in High-Power Production Applications
- Available in crucible volumes up to 100cc for long, uninterrupted evaporation.
- Rated at 14kW* when operated at -10kV.
- Capable of evaporating high rates of material such as aluminum. This makes the model 272 ideal for processes that require a coating layer of one micron or more.
- The 272 is also well suited for operation at lower power levels where a large capacity for subliming materials might be required
| Model 211 | Model 259HV/272 | |
|---|---|---|
| E-Beam Deflection | 270° | 270° |
| Power Rating | 6 kW* | 14 kW* |
| High Voltage Range | -6 kV to -10 kV | -6 kV to -10 kV |
| Lateral Coil Resistance | 7.5 ohms | 3.0 ohms |
| Long. Coil Resistance | 9.5 ohms | 9.6 ohms |
| Water Requirements | 2 gpm(min.)@ 60-70°F (15-21°C) | 3 gpm(min.)@ 60-70°F (15-21°C) |
* Nominal value; actual power rating may vary, depending on customer’s process.
** Model 259 HV is only avalable with 160cc pocket size.
| Model 211 | Model 259HV/272 | |
|---|---|---|
| 1.5cc | 211-05 | |
| 4cc | 211-04 | |
| 7cc | 211-07 | 272-01 |
| 15cc | 211-15 | 272-02 |
| 25cc | 272-03 | |
| 30cc | 272-30 | |
| 40cc | 272-04 | |
| 100cc | 272-05 | |
| 160cc | 259-50 |
** Model 259 HV is only avalable with 160cc pocket size.
Electro-Pneumatic shutter controls are available with 1″, 32mm, or 2-3/4″ CFF feedthrough shutter assemblies.
A source with the Arc-Suppression option is ideal for many applications, such as for optical coating and for ion plating without a pressure barrier. The reduction in arcing results in improved film quality, improved yields, and fewer arc-related maintenance issues.