Telemark Value Engineered Water Vapor Cryotraps

Drawing on our leadership in the field of vacuum PVD coating, Telemark has released a new line of “value engineered” water vapor Cryotraps for PVD applications. To complement our existing line of TVP cryorefrigeration units, these “value engineered” systems support the necessity of water abatement in thin film PVD growth, while offering the lowest price per watt on the market. These systems eliminate the costly use of Ln2 and provide a fast payback for users.
Models include dual or single output 2700 series and single output 1200 series. The value engineered models support “local” front panel manual control as well as remote analog control. The 1200 series affords 55,000 l/sec trapping while the 2700 series provides a whopping 165,000 l/sec trapping capability.
Fully compliant with US EPA, CE and Kyoto Accords, Telemark can increase your pumping times and system throughputs while ensuring the highest quality films.

Please contact Telemark at to find out how Telemark Value Engineered Water Vapor Cryotraps can economically benefit all your PVD processes.

Low Stress, Densified Fluorides for IR Applications

Recent application work with infrared fluorides has demonstrated a significant advantage for IR applications. Using patented pulsing technology, the Telemark/Saintech ion sources have produced fully densified, index stable and stress control of fluoride compounds. These film properties can be achieved by deposition to unheated substrates. The study was performed in the Telemark applications lab and results were presented recently at the OIC conference in Whistler, Canada. Removal of inherent water peaks, index stabilization and fluoride dissociation has been a challenge during ion assist processing of YbF3, MgF2 and other fluoride compounds. Use of traditional end hall sources has often dissociated the fluorides from the compounds resulting in high stress, unstable index and trapped argon in the films. Ion bombardment of these compounds during growth using the patented “pulsing method” has made these materials available for IR and UV applications. Replacement of ThF4 as a low index material has been a goal of the IR community for years. Advantages for UV applications include excellent transparency well into the UV region.

Please contact Telemark at to find out how Telemark Low Pressure, Pulsing Ion Sources can benefit your IR and UV applications.

Affordable Broadband Optical Monitoring Tools

Telemark announces the NVision line of optical measurement tools for thin film coating monitoring and control. With over 25 years of history, these tools allow automatic control of optical properties during the deposition process. Real time, broadband optical monitoring and control systems measuring a single measurement point or up to one hundred monitoring locations provide evaluation and control of thin films during growth. This data is highly accurate and laboratory quality.
Each lab quality measurement location operates in real time giving the operator a powerful insight into the deposition process. Down time and return from maintenance periods are reduced because full optical measurements are made “in process” minimizing the time spent in calibration sample measurements. System calibrations can be done in process. Systems can be configured to cover the wavelength ranges from ultraviolet through visible to infrared (200nm through 2500nm) measuring in real time and storing the data in an open data base for user data mining and report generation. Applications include optical “box” coaters, in-line glass coating systems, web coating, sputtering and custom tools.
Control is available for optical thickness, plasma emission, metal thickness and color. The system supports programming interfaces to industry standard thin film design programs. (Macleod, FilmCalc and others)
The optical system can be configured to operate is transmission mode, reflection mode and is compatible with the Telemark Chip Changer accessory for multiple monitoring samples with automated chip changing.

Please contact Telemark at to find out how Telemark/NVision Optical Monitoring systems can improve your yields and profitability.

Detecting Cut Points on Challenging Applications

One of principal issues of optical monitoring and control is the ability to handle cut points on difficult or noisy applications.  Making measurements when things are easy is by definition easy!  It gets more difficult when the nature of the actual measurement becomes less stable caused by the actual process parameters.  The following display has been created by an offline tool used at Telemark for testing the cut point algorithm offline.  Notice that the blue trace has some noise but is easily filtered by the system as represented by the red trace.  Actual cut point actions are made from the filtered data.

An expanded view of one area gives you a better perspective of the variation in signal do to systematic noise.

In this case one can see the variation caused by the systematic noise in the system.  The deposition was done using electron beam deposition of TiO2 at moderate deposition rates.  The substrate was in good control so the variation was quite limited to a statistically small percentage of the absolute measured intensity.  Good cut points can be achieved with limited filtering of the base data.
Contrast this with the following data taken from a reactive sputter deposition of SiO2.  The substrate was rotating with a table that was not flat.  The resulting deviation of the beam results in a real measurement variation of .6% absolute on a 4.6% reflectance or about 13% error.  The cut point algorithm is looking to discern a change of about .005% absolute or .1% of the signal or better.

If cut points were determined on the basis of the raw blue trace the error would be significant.  With the adaptive filtering in the NVision Optical Monitor the system setup determines the cut point based on the filtered data delivering an endpoint to the layer that is both precise and timely.
Please contact Telemark at to find out how Telemark/NVision Optical Monitoring systems can improve your yields and profitability.

Spectral Match Cut Points

The historical method of calling an end of a layer in optical coating was to monitor a wavelength and when a condition was met calling the end of the layer. As discussed in a previous application note the NVision optical monitor supports this method with good success. There is one problem with this technology; the measurement of only one wavelength limits the potential precision as we are typically waiting until a condition has been exceeded such as a quarter wave minima or maxima. In most cases the end point is called at some time after the actual meeting of the end point criteria condition. This requires the process engineer to design the algorithm to compensate for the delay in the decision.

Click here for pdf NVision_System_Spectral_Match_Application_Note.pdf

Broadband vs Single Wavelength Monitoring

The historical method of calling an end of a layer in optical coating was to monitor a wavelength and when a condition was met calling the end of the layer. In the earliest days this method was done using the human eye of a trained observer. In some cases this is still done today but with the most limited of success. The next advent in coating control came with the advent of the ability to measure automatically the intensity of light in transmission or reflection mode by wavelength.

Click here for pdf Telemark_nvision_broadband_vs_single_wavelegth_comparison.pdf

Electron Beam Secondary Electron Management

Unfortunately there is no guarantee for eliminated “secondary electron“ penetration of substrate. This is caused by simple physics. However Telemark has developed ways to significantly reduce electron damage by design of the Telemark electron beam source.

Click here for pdf – telemark_secondary_electron_app_note_6-26-15.pdf

Model 861 Deposition Controller

Telemark 861 Deposition Controller

Telemark Press Release 9-3-2015
Telemark Announces the Model 861 Deposition Controller

Telemark is announcing a new deposition controller that is a direct replacement for existing Maxtek 360 and Telemark 860 deposition controllers.

The Process Recipes, I/O Settings and Physical Connections are all compatible with existing Maxtek 360/Telemark 860 units.

Telemark data exchange software will allow users to transfer all existing parameters.

Replacement of a failed controller now takes minutes compared to days of re-wiring and re-writing recipes and I/O programming.

The controller supports 6 MHz and 5 MHz operation (2) crystal sensors as standard and is expandable to (4) sensors.

A large color touch screen for front panel control and RS232 for remote operation makes this controller easy to use and integrate into your system.

The units are expandable for additional I/O that can be used for pocket indexing, sweep selection and other ancillary operations.

A Material Library with “user definable” parameters is held within the unit.

Please contact Telemark at for more information and to discuss your thin film process needs.

OMS Witness Glass Changer

Telemark Optical Monitor Chip Changer

“New” Telemark Optical Monitor Witness Glass Changer 50 Monitor Spots That Can Be Used In Any Orientation

  • 50 Optical Monitoring Positions
  • Automatic Position Indexing
  • Back side or Front side Monitoring
  • Reflection or Transmission Measurements
  • Port for Quartz Crystal Rate Sensor
  • 4.5” Flange Mounting

SPIE Photonics West 2017

Please visit us at SPIE Photonics West 2017 booth number 2821
January 31 to February 2
The Moscone Center
San Francisco, California, United States

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